• 2920 Series: broadband plasma patterned wafer defect inspectors with enhanced sensitivity and increased throughput for rapid discovery of yield-critical defects
  • Puma™ 9850: laser scanning patterned wafer defect inspector with high sensitivity across a range of production throughputs to support multiple IC inspection applications
  • Surfscan® SP5: unpatterned wafer defect inspection system with enhanced DUV sensitivity and high productivity for process qualification and monitoring
  • eDR™-7110: e-beam defect review and classification system for accelerated identification of yield-relevant defects
  • KLA-Tencor’s new inspection and review portfolio provides comprehensive defect information, helping chipmakers rapidly solve complex yield issues